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| 表面活性剂浓度对介孔氧化硅薄膜结构和性能的影响研究 |
| Investigation of Surfactant Concentration Effect on the Mesostructure and Dielectric Properties of Mesoporous Silica Films |
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| DOI：10.3969/j.issn.1671-5322.2004.04.003 |
| 中文关键词: 溶胶-凝胶技术 介电常数 多孔氧化硅 薄膜 |
| 英文关键词: Sol-gel process dielectric constant porous silica films |
| 基金项目:国家自然科学基金，国家高技术研究发展计划(863计划) |
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| 中文摘要: |
| 报道了一种新型纳米多孔氧化硅薄膜的制备方法,并详细探讨了表面活性剂浓度对介孔氧化硅薄膜结构和性能的影响.以十六烷基三甲基溴化铵(CTAB)为模板剂,正硅酸乙酯为硅源,盐酸为催化剂, 采用溶胶-凝胶技术,通过提拉法制备了二氧化硅透明介孔薄膜.用红外光谱、小角XRD、原子力显微镜对样品进行了表征,并采用椭偏仪和阻抗分析仪测量薄膜的折射率和介电常数.该薄膜具有很低的介电常数和较好的机械强度,是一种可用于微电子工业的极富应用前景的低介电常数材料. |
| 英文摘要: |
| A novel route to prepare mesoporous SiO2 films is reported in this paper. The influence of CTAB concentration on the structure and properties of mesoporous silica films is studied as well. Silicate sols are prepared with the precursor TEOS and template CTAB catalyzed by hydrochloric acid. The films are prepared by Dip-coating process. FTIR, XRD and AFM are used to characterize the films.The refractive index and dielectric constant are measureed by Ellipsometer and impedance analysis apparatus. It has been found that the films have low dielectric constant and good mechanical properties. Preliminary results present a very positive prospective for intermetal dielectric applications. |
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