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| 多孔薄膜介电常数的测试方法研究 |
| Study on the Measurement Methods for Dielectric Properties of Porous Films |
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| DOI：10.3969/j.issn.1671-5322.2008.02.001 |
| 中文关键词: 多孔薄膜 介电常数 测试方法 |
| 英文关键词: porous films dielectric constant measurement methods |
| 基金项目: |
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| 摘要点击次数: 4545 |
| 全文下载次数: 5138 |
| 中文摘要: |
| 为了降低超大规模集成电路中的信号传输延迟和串扰,多孔低k薄膜材料日益受到人们广泛关注.介绍了测试多孔低k薄膜材料介电常数的几种常用方法及其原理和优缺点,并详细分析了不同的测试方法对测试结果产生的影响. |
| 英文摘要: |
| In the resent years,porous films with ultra-low-k are believed to be necessary to reduce the RC time delay and crosstalk in the VLSI.In this paper,we introduced several measurement methods for dielectric properties of porous films.In addition,the testing results of the dielectric properties which measured by these methods were contrasted and discussed. |
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