|
| 基于ANSYS的原子层沉积加热系统温度均匀性分析 |
| Temperature Uniformity Analysis of Atomic Layer Deposition Heating System Based on ANSYS |
| |
| DOI：10.16018/j.cnki.cn32-1650/n.202202007 |
| 中文关键词: 原子层沉积 反应室 温度均匀性 仿真分析 |
| 英文关键词: atomic layer deposition reaction chamber temperature uniformity simulation analysis |
| 基金项目: |
|
| 摘要点击次数: 878 |
| 全文下载次数: 864 |
| 中文摘要: |
| 为了研究提高原子层沉积加热系统温度均匀性的有效解决方案，采用ANSYS仿真软件建立原子层沉积反应室模型。利用控制变量法，以提高衬底的温度均匀性为目标，观察气体入口流量、电阻片与加热盘的距离和加热温度对反应室热场的影响。随着气体流量的增加，底部流动边界层趋于稳定，加热盘的温度场分布更加均匀；随着加热盘与电阻片之间距离的增大，从电阻片到达石墨盘下表面的热量减少，石墨盘表面最高温度和温差都随之减小，温度均匀性得到提高；随着加热温度的升高，加热盘表面温度增高，因此，可以通过分区加热来提高加热盘表面温度均匀性。 |
| 英文摘要: |
| I In order to research an effective solution to improve the temperature uniformity of the atomic layer deposition heating system, the model of the atomic layer deposition reaction chamber was established by ANSYS simulation software. The controlled variable method was used to simulate the influence of the gas inlet flow rate, the distance and height of the heating plate, and the heating temperature on the thermal field of the reaction chamber, thereby improving the temperature uniformity of the substrate. The increase of gas flow rate made the bottom flow boundary layer stable and the temperature field of the heating plate more uniformly distributed. As the distance between the heating plate and the resistance plate increased, the heat from the resistance plate to the lower surface of the graphite disc decreased, the maximum temperature and temperature difference on the surface of the graphite disc decreased, and the temperature uniformity was improved. As the heating temperature increased, the surface temperature of the heating plate increased. Therefore, the temperature uniformity of the surface of the heating plate can be improved by zonal heating. |
|
查看全文
查看/发表评论 下载PDF阅读器 |
| 关闭 |