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| 基于等离子体注入设备的离子剂量检测装置 |
| Ion Dose Detection Device Based on Plasma Injection Equipment |
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| DOI：10.16018/j.cnki.cn32-1650/n.202302012 |
| 中文关键词: PIII 离子检测 信号调理电路 数据采集 |
| 英文关键词: PIII ion detection signal conditioning circuit data acquisition |
| 基金项目: |
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| 摘要点击次数: 34 |
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| 中文摘要: |
| 针对等离子体浸没式离子注入(PIII)过程中，无法对实际注入目标基板的离子剂量进行检测和显示的问题，设计了一套基于PIII设备的离子剂量检测装置。该装置围绕注入基板放置离子检测装置，等离子体注入过程中，通过信号调理电路和LabVIEW数据采集卡对检测信号进行分析处理，以实现等离子体注入剂量的实时监测。实验结果表明，基于PIII设备的离子剂量检测装置能够有效收集等离子体进行检测，检测结果可以为腔室结构优化和注入工艺改良提供参考依据。 |
| 英文摘要: |
| In order to solve the problem that the ion dose actually injected into the target substrate cannot be detected and displayed during plasma immersion ion implantation (PIII), a set of ion dose detection device based on PIII equipment is designed. The device places an ion detection device around the injection substrate. During the plasma injection process, the detection signal is analyzed and processed through a signal conditioning circuit and a LabVIEW data acquisition card to achieve real-time monitoring of plasma injection dose. The experimental results indicate that the ion dose detection device based on PIII equipment can effectively collect plasma for detection, and the detection results can provide reference basis for chamber structure optimization and injection process improvement. |
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